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EC7400
카테고리
PVD / Sputtering개요
System configuration: Cluster type (up to three process chambers) C to C type Substrate size: φ200mm maximum Cathode: φ7.1" cathode (Up to 4. Varies depending on the module.) Modules: Offset rotary sputtering module (multi-cathode specification) Offset rotary and revolutionary sputtering module Etching module (preprocessing) Preheating module (preprocessing)
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
- 제품을 찾을 수 없음