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EL3200
카테고리
PVD / Sputtering개요
Electronic component production System configuration: Horizontal inline type Substrate size: Effective deposition area 300mm×450mm Cathode: 5"×16" cathode×3 (single side)
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
- 제품을 찾을 수 없음