설명
PVD (Physical Vapor Deposition)환경 설정
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM 모델 설명
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ULVAC
ENTRON-EX W300
검증됨
카테고리
PVD / Sputtering
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
48141
웨이퍼 사이즈:
12"/300mm
빈티지:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기ULVAC
ENTRON-EX W300
카테고리
PVD / Sputtering
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
48141
웨이퍼 사이즈:
12"/300mm
빈티지:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
PVD (Physical Vapor Deposition)환경 설정
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM 모델 설명
미제공문서
문서 없음