설명
Plasma precipitation machine환경 설정
환경 설정 없음OEM 모델 설명
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.문서
문서 없음
ULVAC
CC-400
검증됨
카테고리
PECVD
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72041
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
CC-400
검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72041
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Plasma precipitation machine환경 설정
환경 설정 없음OEM 모델 설명
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.문서
문서 없음