설명
Polysilicon Etch환경 설정
Alliance (A6) TCP 9400DSiE -Qty 1 - A6 Platform -Qty 3 - 9400DSiE Chambers 94-1608(F119229-PM2) 94-1673(F137127-PM1) 94-1609(F119229-PM4)OEM 모델 설명
The TCP 9400DSiE is a deep silicon etch system designed for high-volume production. It offers broad process capability and flexibility for MEMS, advanced packaging, and power semiconductor applications. The system is based on Lam’s TCP 9400 Etch Series and features a patented TCP plasma source for uniform ion flux and high cross-wafer uniformity. Lam’s Waferless AutoClean technology maintains a consistent chamber environment for superior process stability. With over 1,300 chambers installed worldwide, the TCP 9400DSiE is a reliable choice for meeting the challenges of Si DRIE.문서
문서 없음
LAM RESEARCH CORPORATION
TCP 9400DSiE
검증됨
카테고리
RIE
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
83169
웨이퍼 사이즈:
6"/150mm
빈티지:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
LAM RESEARCH CORPORATION
TCP 9400DSiE
카테고리
RIE
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
83169
웨이퍼 사이즈:
6"/150mm
빈티지:
2009
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Polysilicon Etch환경 설정
Alliance (A6) TCP 9400DSiE -Qty 1 - A6 Platform -Qty 3 - 9400DSiE Chambers 94-1608(F119229-PM2) 94-1673(F137127-PM1) 94-1609(F119229-PM4)OEM 모델 설명
The TCP 9400DSiE is a deep silicon etch system designed for high-volume production. It offers broad process capability and flexibility for MEMS, advanced packaging, and power semiconductor applications. The system is based on Lam’s TCP 9400 Etch Series and features a patented TCP plasma source for uniform ion flux and high cross-wafer uniformity. Lam’s Waferless AutoClean technology maintains a consistent chamber environment for superior process stability. With over 1,300 chambers installed worldwide, the TCP 9400DSiE is a reliable choice for meeting the challenges of Si DRIE.문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음