설명
2 Chambers RTP XE, 2 Cool Down환경 설정
2 Chambers RTP XE, 2 Cool DownOEM 모델 설명
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.문서
문서 없음
APPLIED MATERIALS (AMAT)
CENTURA RTP
검증됨
카테고리
RTP/RTA
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105341
웨이퍼 사이즈:
8"/200mm
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA RTP
카테고리
RTP/RTA
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105341
웨이퍼 사이즈:
8"/200mm
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
2 Chambers RTP XE, 2 Cool Down환경 설정
2 Chambers RTP XE, 2 Cool DownOEM 모델 설명
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.문서
문서 없음