설명
WAFER SCRUBBER환경 설정
WETOEM 모델 설명
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.문서
문서 없음
TEL / TOKYO ELECTRON
SS4
검증됨
카테고리
Wafer Scrubber
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
45962
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
SS4
검증됨
카테고리
Wafer Scrubber
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
45962
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
WAFER SCRUBBER환경 설정
WETOEM 모델 설명
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.문서
문서 없음