설명
– It is a FE SEM with Ga FIB column, airlock, Kliendiek MM3 micro-manipulator, and multi-chemistry gas-injection system (currently it runs C and W for depositions, though it has capacity for others in non-heated precursor chambers). – It is also set up with a Leica VCT100 cryo-stage, though the interlock is currently not functional (can still be used for cryo during milling, but requires samples to be loaded and unloaded at room temperature and in atmosphere). – Oxford EDS system환경 설정
환경 설정 없음OEM 모델 설명
The NVision 40 operates with two beams, one electron beam and one ion beam. Both beams can be used independently of each other to generate images using the secondary electrons emitted from the surface of the specimen. The ion beam can be used for imaging in addition material removal or coating purposes.문서
문서 없음
ZEISS / CARL ZEISS
NVision 40
검증됨
카테고리
SEM
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50917
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
ZEISS / CARL ZEISS
NVision 40
검증됨
카테고리
SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50917
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
– It is a FE SEM with Ga FIB column, airlock, Kliendiek MM3 micro-manipulator, and multi-chemistry gas-injection system (currently it runs C and W for depositions, though it has capacity for others in non-heated precursor chambers). – It is also set up with a Leica VCT100 cryo-stage, though the interlock is currently not functional (can still be used for cryo during milling, but requires samples to be loaded and unloaded at room temperature and in atmosphere). – Oxford EDS system환경 설정
환경 설정 없음OEM 모델 설명
The NVision 40 operates with two beams, one electron beam and one ion beam. Both beams can be used independently of each other to generate images using the secondary electrons emitted from the surface of the specimen. The ion beam can be used for imaging in addition material removal or coating purposes.문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음