The 1540EsB CrossBeam® is a powerful tool that combines a fully integrated Energy and angle selective Backscattered electron (EsB) detector. This instrument offers ultra high resolution for surface sensitive SE imaging and compositional information through BSE imaging. The new EsB detection principle features an integrated filtering grid to enhance the image quality and requires no additional adjustments. The EsB detection principle is less sensitive to edge contrast and charging effects, which increases the accuracy in measurements of interfaces, particles, and features.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

1540 EsB

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