설명
Equipment specification: -Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. -Evaporation source : EGN-4020_40ml x 20 pockets). -EB power supply : HPS- 1000N-100( 10 kw). -Internal Jig : Revolution system. -Substrate holder : 6 inch x 25 pcs. -Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200__Max 300_. -Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). - Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)환경 설정
【Equipment specification】●Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. ●Evaporation source : EGN-4020（40ml x 20 pockets). ●EB power supply : HPS- 1000N-100( 10 kw). ●Internal Jig : Revolution system. ●Substrate holder : φ6 inch x 25 pcs. ●Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200℃、Max 300℃. ●Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). ● Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)OEM 모델 설명
Batch Type System Various evaporation sources can be loaded. (EB, RH, EB + RH) Substrate size: φ2 to 6 inch Supports rectangular, Si, compounds, glass and ceramics substrates문서
문서 없음
ULVAC
EI-7L
검증됨
카테고리
Thermal Evaporators
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
51531
웨이퍼 사이즈:
알 수 없음
빈티지:
1905
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
EI-7L
카테고리
Thermal Evaporators
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
51531
웨이퍼 사이즈:
알 수 없음
빈티지:
1905
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Equipment specification: -Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. -Evaporation source : EGN-4020_40ml x 20 pockets). -EB power supply : HPS- 1000N-100( 10 kw). -Internal Jig : Revolution system. -Substrate holder : 6 inch x 25 pcs. -Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200__Max 300_. -Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). - Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)환경 설정
【Equipment specification】●Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. ●Evaporation source : EGN-4020（40ml x 20 pockets). ●EB power supply : HPS- 1000N-100( 10 kw). ●Internal Jig : Revolution system. ●Substrate holder : φ6 inch x 25 pcs. ●Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200℃、Max 300℃. ●Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). ● Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)OEM 모델 설명
Batch Type System Various evaporation sources can be loaded. (EB, RH, EB + RH) Substrate size: φ2 to 6 inch Supports rectangular, Si, compounds, glass and ceramics substrates문서
문서 없음