KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

FT-700

SpectraCD 200

FLX-5500

PWG3

SpectraCD system, introduced in June 2001, provides non-destructive simultaneous and extensive CD, feature shape, and film-thickness measurements from a single tool, making it one of the industry's lowest cost-of-ownership, production-worthy CD metrology systems for 193nm lithography applications and sub-100nm device production.

SpectraCD

UV-1080SE

UV-1050SE

ASET-F5x SCD

UV-1270SE

UV-1070SE

 The SpectraFilm LD10 system utilizes a laser-driven plasma light source to produce reliable, high-precision film measurements for a broad range of film layers, including the thin, multilayer film stacks used in forming complex device structures such as FinFETs. An infrared-based subsystem on the SpectraFilm LD10 enables characterization of thick films and film stacks, such as those found in 3D NAND flash devices.

SpectraFilm LD10

SM200/e

FLX 2320-S

SpectraCD XTS+

SpectraCD XTS

UV-1080

FLX 5200

FLX 2320-R

UV-1270

SpectraCD XTR 

The SpectraFilm F1 film metrology system, introduced in September 2017, employs new optical technologies that determine single- and multi-layer film thicknesses and uniformity with high precision to monitor deposition processes in production, and deliver bandgap data that predict device electrical performance earlier than end of line test.

SpectraFilm F1

The ASET-F5X Pro film metrology system provides reliable, affordable and high precision thin film measurements of film thickness, refractive index, and bow/stress capability across a broad range of f ilm stacks and geometries.  The system features capabilities that provide absolute accuracy, reproducibility and system-to-system matching required for fabs that manufacture devices for the IOT, automotive and mobile markets. The ASET-F5x Pro integrates precise optical spectroscopic ellipsometry and reflectometry metrology technologies in a single system to manage the full range of thin film measurement challenges required by µLED, MEMs and IC manufactures.  

ASET-F5x Pro

UV-1250

UV-1070

KLA unveiled SpectraCD 100—the next-generation inline optical CD metrology system for advanced patterning process control at the 90-nm and 65-nm nodes.  SpectraCD 100 utilizes a new hardware platform and advanced 3-D modeling capabilities to conduct complete profile measurements of yield-critical structures with a two-fold improvement in precision and tool-to-tool matching over our previous-generation SpectraCD system.  These capabilities, coupled with SpectraCD 100’s production throughput and ability to non-destructively measure features down to 30-nm, provide chipmakers with an effective inline process control and product dispositioning tool for their most critical patterning steps.

SpectraCD 100

The Prometrix UV-1050 system is designed for thin film measurement applications and features advanced reflective optics, broadband UV technology, enhanced algorithms for advanced measurements, reflectivity and Gamma curve capability, and spectral analysis software for greater accuracy and repeatability.

UV-1050

FT-750

FLX 2908

The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.

ASET-F5x

The Prometrix UV-1280SE is a production thin film measurement system that combines dual-beam spectrophotometry and broadband spectroscopic ellipsometry. It can directly measure film thickness, refractive index, and extinction coefficient of single- and multi-layer thin film stacks simultaneously. The system is easy to use, lowers cost of ownership, and increases production efficiency. It is useful for both process control and advanced materials development.

UV-1280SE

The Prometrix UV-1250SE Thin Film Measurement System is a tool that can measure film thickness, refractive index, extinction coefficient, and goodness-of-fit of single or multi-layer thin film stacks. It combines spectroscopic ellipsometry and broadband UV spectrophotometry for non-destructive optical characterization. This results in greater productivity and tighter process control.

UV-1250SE

The Tencor FLX-2320 is an equipment that accurately measures film stress at temperatures from -65°C to 500°C, using dual wavelength technology to work on all types of films, including transparent ones like silicon nitride. This helps better understand film properties in simulated process environments.

FLX 2320

FX200

the ASET-F5, our third generation spectroscopic ellipsometer, which addresses the difficult film measurement needs that come from the continuing evolution of film development driven by shorter line widths. These new films demand an increasing capability to characterize and control them in production, a capability provided by the ASET-F5.

ASET-F5

UV-1280

The Tencor FLX-5400 is an automated wafer handling system that uses patented dual wavelength technology to create 2D and 3D maps of radial stress. It has a unique calibration algorithm and automatic substrate thickness determination for enhanced measurement accuracy.

FLX 5400

FLX 2320A

In February 2006, KLA introduced the SpectraCD-XT—our fourth-generation of inline optical CD metrology systems for advanced patterning process control at the 90nm and 65nm nodes. SpectraCD-XT is a non-destructive dedicated CD and profile metrology system built on our high-throughput, production-proven Archer platform. The tool is the only high performance spectroscopic ellipsometry (SE)-based

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

KLA

개요

활성 등재물

총 제품 수

서비스

상위 KLA Thin Film / Film Thickness

SpectraFilm F1

FLX-5500

SpectraCD 200

ASET-F5x Pro

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.

모든 KLA Thin Film / Film Thickness