설명
설명 없음환경 설정
Ozone resist stripOEM 모델 설명
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.문서
문서 없음
SEMITOOL
SIRIUS
검증됨
카테고리
Wet Benches - Manual
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111843
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMITOOL
SIRIUS
카테고리
Wet Benches - Manual
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111843
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Ozone resist stripOEM 모델 설명
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.문서
문서 없음