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ASML PAS 5500/300C
    설명
    설명 없음
    환경 설정
    DUV Stepper - Lens Unit, Cables and Panels only
    OEM 모델 설명
    The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.
    문서

    문서 없음

    ASML

    PAS 5500/300C

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    검증됨

    카테고리
    248nm DUV

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    17645


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음

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    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
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    유사 등재물
    모두 보기
    ASML PAS 5500/300C

    ASML

    PAS 5500/300C

    248nm DUV
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    ASML

    PAS 5500/300C

    verified-listing-icon
    검증됨
    카테고리
    248nm DUV
    마지막 검증일: 60일 이상 전
    listing-photo-iPznR6r0iY2H2jfrRvljuuqf5IkZoHlv96wU3quwxoA-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    17645


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    DUV Stepper - Lens Unit, Cables and Panels only
    OEM 모델 설명
    The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.
    문서

    문서 없음

    유사 등재물
    모두 보기
    ASML PAS 5500/300C

    ASML

    PAS 5500/300C

    248nm DUV빈티지: 0조건: 중고마지막 검증일: 60일 이상 전
    ASML PAS 5500/300C

    ASML

    PAS 5500/300C

    248nm DUV빈티지: 0조건: 중고마지막 검증일: 60일 이상 전