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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
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OEM 모델 설명
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
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카테고리
Ashers / Plasma Cleaner

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

74426


웨이퍼 사이즈:

알 수 없음


빈티지:

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Have Additional Questions?
Logistics Support
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Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2100

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검증됨
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
listing-photo-4ba65ef1a73640aa92dab53ce5af8d6c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

74426


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
문서

문서 없음