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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
설명
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: Express type (Upgrade Bell Jar and Quartz Tube) EPD: 4ea (#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
환경 설정
환경 설정 없음
OEM 모델 설명
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
문서

문서 없음

카테고리
Ashers / Plasma Cleaner

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

81934


웨이퍼 사이즈:

12"/300mm


빈티지:

2004


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2130

verified-listing-icon
검증됨
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
listing-photo-20fda978355348f8834bf5a33bbc3d1f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48608/20fda978355348f8834bf5a33bbc3d1f/5ec26b8c6f2c488993dbe6fe18343ed1_6270df09f9cd4e4e9145afd35602a3a11201a_mw.jpeg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

81934


웨이퍼 사이즈:

12"/300mm


빈티지:

2004


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: Express type (Upgrade Bell Jar and Quartz Tube) EPD: 4ea (#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
환경 설정
환경 설정 없음
OEM 모델 설명
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
문서

문서 없음