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설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.문서
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HITACHI
S-9260
검증됨
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
109926
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
S-9260
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
109926
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.문서
문서 없음