메인 콘텐츠로 건너뛰기
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기

Moov logo

Moov Icon
HITACHI S-9260
  • HITACHI S-9260
  • HITACHI S-9260
  • HITACHI S-9260
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.
문서

문서 없음

verified-listing-icon

검증됨

카테고리
CD-SEM

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

109926


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

HITACHI

S-9260

verified-listing-icon
검증됨
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
listing-photo-d16bfb43ba434e8b9de72402a6327a86-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

109926


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.
문서

문서 없음