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설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.문서
문서 없음
KLA
eCD-1
카테고리
CD-SEM
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
126101
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
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설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.문서
문서 없음