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KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
설명
설명 없음
환경 설정
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 모델 설명
미제공
문서

문서 없음

KLA

8100XPR

verified-listing-icon

검증됨

카테고리
CD-SEM

마지막 검증일: 60일 이상 전

주요 품목 세부 정보
조건:

Used

작동 상태:

알 수 없음

제품 ID:

117151

웨이퍼 사이즈:

알 수 없음

빈티지:

1999

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
KLA 8100XPR

KLA

8100XPR

CD-SEM
빈티지: 1999조건: 중고
마지막 검증일60일 이상 전

KLA

8100XPR

verified-listing-icon
검증됨
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/f2260899b822425c9a6163a2e8fe5aa7_686d7f194ed44493a92158e22571c89e1201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/7d3c16d75e6447459a9902cb4524ff88_15183797c5a549ffb9ee672fed5d30601201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/e4c5cb5a01f24d1da2d676438b9f3940_aec5c1be02ef4c698ed0b295acb2487b_mw.png
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/020d06e8769446a7b874bce829955102_040c9f8447814194bd5978a764d9cee1_mw.png
주요 품목 세부 정보
조건:

Used

작동 상태:

알 수 없음

제품 ID:

117151

웨이퍼 사이즈:

알 수 없음

빈티지:

1999

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM 모델 설명
미제공
문서

문서 없음

유사 등재물
모두 보기
KLA 8100XPR

KLA

8100XPR

CD-SEM빈티지: 1999조건: 중고마지막 검증일:60일 이상 전