설명
CD SEM환경 설정
Main Body, Column, Load Port, Chamber, Trubo Pump. Workstation and PC missing, Main body with missing, TMP&Turbo pump controller. Stage controller failed. Main body with no locking. 8250 tool, 2x Loader(A,C), PRI Robot and Aligner.OEM 모델 설명
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.문서
문서 없음
KLA
8250
검증됨
카테고리
CD-SEM
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
95320
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
8250
검증됨
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
95320
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
CD SEM환경 설정
Main Body, Column, Load Port, Chamber, Trubo Pump. Workstation and PC missing, Main body with missing, TMP&Turbo pump controller. Stage controller failed. Main body with no locking. 8250 tool, 2x Loader(A,C), PRI Robot and Aligner.OEM 모델 설명
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.문서
문서 없음