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APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
  • APPLIED MATERIALS (AMAT) REFLEXION
설명
설명 없음
환경 설정
details added below
OEM 모델 설명
The Applied Reflexion CMP system is Applied Materials' 300mm CMP platform delivering innovation and productivity for 100nm and beyond. Based on the production-proven Applied Mirra Mesa CMP architecture, the Applied Reflexion system offers 300mm processing capabilities for oxide, STI, polysilicon, tungsten, and copper applications. Titan Head technology delivers excellent dishing and erosion performance with better repeatability. The system's FullScan endpoint system enables superior process results by scanning the entire wafer. Applied Reflexion's cleaner offers a two-stage brush scrub with single-wafer megasonics in vertical orientation to minimize footprint. Its space efficient design also features factory automation and advanced process control with integrated film thickness metrology and particle monitoring options, as well as a dual wafer robot which increases tool throughput for thin films.
문서
카테고리
CMP

마지막 검증일: 23일 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

123302


웨이퍼 사이즈:

12"/300mm


빈티지:

2011


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

REFLEXION

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검증됨
카테고리
CMP
마지막 검증일: 23일 전
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주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

123302


웨이퍼 사이즈:

12"/300mm


빈티지:

2011


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
details added below
OEM 모델 설명
The Applied Reflexion CMP system is Applied Materials' 300mm CMP platform delivering innovation and productivity for 100nm and beyond. Based on the production-proven Applied Mirra Mesa CMP architecture, the Applied Reflexion system offers 300mm processing capabilities for oxide, STI, polysilicon, tungsten, and copper applications. Titan Head technology delivers excellent dishing and erosion performance with better repeatability. The system's FullScan endpoint system enables superior process results by scanning the entire wafer. Applied Reflexion's cleaner offers a two-stage brush scrub with single-wafer megasonics in vertical orientation to minimize footprint. Its space efficient design also features factory automation and advanced process control with integrated film thickness metrology and particle monitoring options, as well as a dual wafer robot which increases tool throughput for thin films.
문서