설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
Lam developed the Teres CMP integrated polishing and cleaning system based on a technological approach different from that of conventional polishers which utilize a rotating table and rotating polishing heads. Lam has developed a proprietary linear polishing method and has designed its polishing system to be installed in a Class 1 cleanroom environment to planarize patterned films on wafers, and to polish wafers at higher rates and achieve the uniformity and planarity that is necessary to manufacture advanced semiconductor devices.문서
문서 없음
카테고리
CMP
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
141190
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
TERES
카테고리
CMP
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
141190
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
Lam developed the Teres CMP integrated polishing and cleaning system based on a technological approach different from that of conventional polishers which utilize a rotating table and rotating polishing heads. Lam has developed a proprietary linear polishing method and has designed its polishing system to be installed in a Class 1 cleanroom environment to planarize patterned films on wafers, and to polish wafers at higher rates and achieve the uniformity and planarity that is necessary to manufacture advanced semiconductor devices.문서
문서 없음