설명
2 coat cups, 1 adhesion hot plates, 2 DHP, 6 Low temp hot plate, 3 chill plates Left, 2C, 1AD, 2DHP, 6HP, 3COL Main Frame: Single Block LD: 3ea, modified to Fortrend환경 설정
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right, 2D, 1WEE, 9HP, 3COL Main Frame: Dual BlockOEM 모델 설명
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.문서
문서 없음
TEL / TOKYO ELECTRON
MARK 8
검증됨
카테고리
Coaters & Developers
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105225
웨이퍼 사이즈:
8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
MARK 8
카테고리
Coaters & Developers
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105225
웨이퍼 사이즈:
8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
2 coat cups, 1 adhesion hot plates, 2 DHP, 6 Low temp hot plate, 3 chill plates Left, 2C, 1AD, 2DHP, 6HP, 3COL Main Frame: Single Block LD: 3ea, modified to Fortrend환경 설정
2 develop cups, 9 Low temp Hot plates, 3 chill plates, WEE Right, 2D, 1WEE, 9HP, 3COL Main Frame: Dual BlockOEM 모델 설명
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.문서
문서 없음