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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
    설명
    설명 없음
    환경 설정
    HDP nitride, PECVD oxide/nitride
    OEM 모델 설명
    The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
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    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

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    검증됨

    카테고리
    CVD (Metalization)

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    98255


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2002

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    유사 등재물
    모두 보기
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    CVD (Metalization)
    빈티지: 0조건: 중고
    마지막 검증일4일 전

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    verified-listing-icon
    검증됨
    카테고리
    CVD (Metalization)
    마지막 검증일: 60일 이상 전
    listing-photo-bcd4b292b5fd4dcc9af3c38747b5aef9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    98255


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2002


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    HDP nitride, PECVD oxide/nitride
    OEM 모델 설명
    The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    CVD (Metalization)빈티지: 0조건: 중고마지막 검증일: 4일 전
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    CVD (Metalization)빈티지: 0조건: 중고마지막 검증일: 4일 전
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    CVD (Metalization)빈티지: 0조건: 중고마지막 검증일: 4일 전