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TEL / TOKYO ELECTRON TRIAS HIGH-k
    설명
    설명 없음
    환경 설정
    CVD System, 12” <45nm process 2 Chambers: CVD & ALD Process: NiOx, HfOx Trias cluster: 2 Loadports LM: Front end Main power distribution (MPD) Transfer module, TM EX reactor, PM2: Plasma capability: No Includes: Ozonizer & H20 Box 2 Touch screens ozonizer High-k CVD reactor PM4: Thermal based deposition Transformer box (Hi-K) option elec box: Manuals & Spareparts included Machine is in absolute as good as new condition ex R&D facility PM2: Hafnium Nickel Titaan Vanadium PM4: Hafnium Nickel Titaan Ruthenium Strontium
    OEM 모델 설명
    Trias High-k CVD system is a 300mm single-wafer cluster tool designed to produce thin-film materials required for the advanced gate stack, which will be incorporated in the most advanced semiconductor devices at the 45nm node and beyond.
    문서

    TEL / TOKYO ELECTRON

    TRIAS HIGH-k

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    검증됨

    카테고리

    CVD (Metalization)
    마지막 검증일: 60일 이상 전
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    39978


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2010

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TRIAS HIGH-k
    TEL / TOKYO ELECTRONTRIAS HIGH-kCVD (Metalization)
    빈티지: 2010조건: 중고
    마지막 검증일60일 이상 전

    TEL / TOKYO ELECTRON

    TRIAS HIGH-k

    verified-listing-icon

    검증됨

    카테고리

    CVD (Metalization)
    마지막 검증일: 60일 이상 전
    listing-photo-839571758a794d1d8aa3fc12fd940b18-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1148/839571758a794d1d8aa3fc12fd940b18/ee3bac8a89a844eabb7ff8bea2c6e62b_d9a9802520a940b7a88999a9e74a358c_mw.jpeg
    listing-photo-839571758a794d1d8aa3fc12fd940b18-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1148/839571758a794d1d8aa3fc12fd940b18/2e1e234ec43b4de19f5202359a2afdbc_486551c7eacc44dea23ebb67cbc35611_mw.jpeg
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    listing-photo-839571758a794d1d8aa3fc12fd940b18-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1148/839571758a794d1d8aa3fc12fd940b18/91626fecf21348cdb0cbfe6c9d16996b_0cedca63f6c6491883343c678815c1a4_mw.jpeg
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    listing-photo-839571758a794d1d8aa3fc12fd940b18-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1148/839571758a794d1d8aa3fc12fd940b18/e5ead384045241f9b273a13ed41ad3d8_49660dd4508448649ce5a2d39a94f1fd_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    39978


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2010


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    CVD System, 12” <45nm process 2 Chambers: CVD & ALD Process: NiOx, HfOx Trias cluster: 2 Loadports LM: Front end Main power distribution (MPD) Transfer module, TM EX reactor, PM2: Plasma capability: No Includes: Ozonizer & H20 Box 2 Touch screens ozonizer High-k CVD reactor PM4: Thermal based deposition Transformer box (Hi-K) option elec box: Manuals & Spareparts included Machine is in absolute as good as new condition ex R&D facility PM2: Hafnium Nickel Titaan Vanadium PM4: Hafnium Nickel Titaan Ruthenium Strontium
    OEM 모델 설명
    Trias High-k CVD system is a 300mm single-wafer cluster tool designed to produce thin-film materials required for the advanced gate stack, which will be incorporated in the most advanced semiconductor devices at the 45nm node and beyond.
    문서
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TRIAS HIGH-k
    TEL / TOKYO ELECTRON
    TRIAS HIGH-k
    CVD (Metalization)빈티지: 2010조건: 중고마지막 검증일: 60일 이상 전