설명
설명 없음환경 설정
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM 모델 설명
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.문서
문서 없음
카테고리
CVD
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
142476
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA HDP
카테고리
CVD
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
142476
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM 모델 설명
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.문서
문서 없음