설명
1 Chamber Ultima TE with 1 chamber 8”, 2nd New Wide Body LL, Ch#A, MS Cool Chamber, Orient Chamber Centura Mainframe with front panel Buffer Chamber with Lid with sensor, cable, working function System controller configuration for 3 chamber, WTM HP transfer system Gas panel pallet & MFC and valves for ch#A Turbo pump ENI RF Rack RPS Chamber Process Kit include ESC 1set환경 설정
환경 설정 없음OEM 모델 설명
Centura Ultima HDP 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing. The Ultima HDP system features dual RF coils for superior gap-fill capability across the wafer; its innovative electrostatic chuck enables excellent film quality and uniformity; combined with remote plasma clean, it delivers exceptional defect and mean-wafer-between-clean performance. The product’s advanced technology enables deposition of both undoped and doped films for a wide range of applications, including STI, PMD, ILD, IMD, and passivation. Its versatility further extends to etchback and high-density plasma treatment for improved film quality.문서
문서 없음
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
132906
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA ULTIMA TE
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
132906
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
1 Chamber Ultima TE with 1 chamber 8”, 2nd New Wide Body LL, Ch#A, MS Cool Chamber, Orient Chamber Centura Mainframe with front panel Buffer Chamber with Lid with sensor, cable, working function System controller configuration for 3 chamber, WTM HP transfer system Gas panel pallet & MFC and valves for ch#A Turbo pump ENI RF Rack RPS Chamber Process Kit include ESC 1set환경 설정
환경 설정 없음OEM 모델 설명
Centura Ultima HDP 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing. The Ultima HDP system features dual RF coils for superior gap-fill capability across the wafer; its innovative electrostatic chuck enables excellent film quality and uniformity; combined with remote plasma clean, it delivers exceptional defect and mean-wafer-between-clean performance. The product’s advanced technology enables deposition of both undoped and doped films for a wide range of applications, including STI, PMD, ILD, IMD, and passivation. Its versatility further extends to etchback and high-density plasma treatment for improved film quality.문서
문서 없음