설명
P-5000 Mark II DLH SACVD환경 설정
CVD DxL SACVD TEOS SACVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software: b6.02 MF: P5000 Mark II Qty 4 - DLH SACVD: TEOS Deposition Chuck: Anodized Aluminum MFCs: 24 Horiba Z500 Digital MFCs Robot: ROBOT ASSY 8 IN AMAT 5000 Dry Pumps: 4 IXH620, 1 Edwards IXL120 Chillers: AMAT Heatex 1 Edwards Atlas Abatement Upgrades: PLIS, V440 SBC Power glitch protection Known Missing Parts: Heater jackets, AI board Qty 1 ; Tool is not completeOEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음
카테고리
CVD
마지막 검증일: 25일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
125401
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
빈티지:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
P5000 CVD
카테고리
CVD
마지막 검증일: 25일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
125401
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
빈티지:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
P-5000 Mark II DLH SACVD환경 설정
CVD DxL SACVD TEOS SACVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software: b6.02 MF: P5000 Mark II Qty 4 - DLH SACVD: TEOS Deposition Chuck: Anodized Aluminum MFCs: 24 Horiba Z500 Digital MFCs Robot: ROBOT ASSY 8 IN AMAT 5000 Dry Pumps: 4 IXH620, 1 Edwards IXL120 Chillers: AMAT Heatex 1 Edwards Atlas Abatement Upgrades: PLIS, V440 SBC Power glitch protection Known Missing Parts: Heater jackets, AI board Qty 1 ; Tool is not completeOEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음