설명
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase환경 설정
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM 모델 설명
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.문서
문서 없음
카테고리
CVD
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150735
웨이퍼 사이즈:
8"/200mm
빈티지:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
카테고리
CVD
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150735
웨이퍼 사이즈:
8"/200mm
빈티지:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase환경 설정
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM 모델 설명
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.문서
문서 없음