설명
설명 없음환경 설정
Process: TEOS Wafer size: Set up for 6” (double wide). Can do 4”, 5” (double wide), also 8” after carrier modification TEOS process: TEOS, TMPi, TMB MB Wafer cassette slots: 25 slots, 2 load- and 2 unload stations and overflow Temperature / Belt speed range: Up to 550 °C / 0~8 inch / minOEM 모델 설명
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.문서
문서 없음
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
122830
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
AVIZA / WATKINS-JOHNSON
WJ-999
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
122830
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Process: TEOS Wafer size: Set up for 6” (double wide). Can do 4”, 5” (double wide), also 8” after carrier modification TEOS process: TEOS, TMPi, TMB MB Wafer cassette slots: 25 slots, 2 load- and 2 unload stations and overflow Temperature / Belt speed range: Up to 550 °C / 0~8 inch / minOEM 모델 설명
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.문서
문서 없음