설명
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroom환경 설정
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEM 모델 설명
미제공문서
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FIRST NANO
EasyTube 3000
검증됨
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
110952
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
FIRST NANO
EasyTube 3000
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
110952
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroom환경 설정
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEM 모델 설명
미제공문서
문서 없음