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LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
설명
W
환경 설정
W
OEM 모델 설명
ALTUS DirectFill is a tungsten nitride/tungsten deposition system designed for advanced contact and via-fill applications at 65 nm and below. It simplifies the tungsten deposition process by replacing the standard multi-tool Ti/TiN/W approach with a single three-module system. The advanced plug-fill technology of ALTUS DirectFill can reduce contact resistance and lower the overall cost of ownership by 50% or more when compared to existing processes. This makes it a cost-effective and efficient solution for advanced contact and via-fill applications.
문서

문서 없음

카테고리
CVD

마지막 검증일: 5일 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

76014


웨이퍼 사이즈:

12"/300mm


빈티지:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS

ALTUS DirectFill MAX

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검증됨
카테고리
CVD
마지막 검증일: 5일 전
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주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

76014


웨이퍼 사이즈:

12"/300mm


빈티지:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
W
환경 설정
W
OEM 모델 설명
ALTUS DirectFill is a tungsten nitride/tungsten deposition system designed for advanced contact and via-fill applications at 65 nm and below. It simplifies the tungsten deposition process by replacing the standard multi-tool Ti/TiN/W approach with a single three-module system. The advanced plug-fill technology of ALTUS DirectFill can reduce contact resistance and lower the overall cost of ownership by 50% or more when compared to existing processes. This makes it a cost-effective and efficient solution for advanced contact and via-fill applications.
문서

문서 없음