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KLA AIT I
    설명
    Operational upon removal from the fab. Skidded, vapor barrier bagged, wrapped. Not crated. Complete systems, with no missing parts.
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    문서

    문서 없음

    verified-listing-icon

    검증됨

    카테고리
    Defect Inspection

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    131730


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    KLA AIT I

    KLA

    AIT I

    Defect Inspection
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    KLA

    AIT I

    verified-listing-icon
    검증됨
    카테고리
    Defect Inspection
    마지막 검증일: 60일 이상 전
    listing-photo-3e5bf487751746baa8c7fe6f6848062b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    131730


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Operational upon removal from the fab. Skidded, vapor barrier bagged, wrapped. Not crated. Complete systems, with no missing parts.
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA AIT I

    KLA

    AIT I

    Defect Inspection빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    KLA AIT I

    KLA

    AIT I

    Defect Inspection빈티지: 1997조건: 중고마지막 검증일:60일 이상 전
    KLA AIT I

    KLA

    AIT I

    Defect Inspection빈티지: 2008조건: 개조됨마지막 검증일:60일 이상 전