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설명
설명 없음환경 설정
- Currently Configured for 6"/150mm & 8"/200mm Wafers - Double Darkfield Inspection Tool - SECS II/GEM Communication Interface - Low Contact Chuck (AIT I) - Multi Channel Collection Optics System with Independent Programmable Spatial Filters - Pentium CPU with Windows NT Installed - Wafer Transfer Area Housing Cover - Wafer Handling Module - High Voltage Electronics - Front and Rear EMO’s with Covers - Flat Panel Display for AIT - Fold Down Keyboard Tray with Built In Mouse - X/Y Drive/Controller Chassis and Motion Controller Card - Blower Box (exhaust hoses not included) - Operations Manual and DocumentationOEM 모델 설명
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.문서
문서 없음
유사 등재물
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KLA
AIT I
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
15509
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
1997
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설명
설명 없음환경 설정
- Currently Configured for 6"/150mm & 8"/200mm Wafers - Double Darkfield Inspection Tool - SECS II/GEM Communication Interface - Low Contact Chuck (AIT I) - Multi Channel Collection Optics System with Independent Programmable Spatial Filters - Pentium CPU with Windows NT Installed - Wafer Transfer Area Housing Cover - Wafer Handling Module - High Voltage Electronics - Front and Rear EMO’s with Covers - Flat Panel Display for AIT - Fold Down Keyboard Tray with Built In Mouse - X/Y Drive/Controller Chassis and Motion Controller Card - Blower Box (exhaust hoses not included) - Operations Manual and DocumentationOEM 모델 설명
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.문서
문서 없음