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KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
  • KLA CANDELA CS20
설명
KLA-Tencor Candela CS20 Optical Defect Inspection
환경 설정
Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å; deep. - Pits: 20 μm diameter, 50 Å; deep - Stains: 20 μm diameter, 10 Å; thick [ Application ] - Opaque substrates - EPI Layers - Transparent film coatings (SiC, GaN, Sapphire
OEM 모델 설명
The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
문서

문서 없음

카테고리
Defect Inspection

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

101990


웨이퍼 사이즈:

6"/150mm


빈티지:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

CANDELA CS20

verified-listing-icon
검증됨
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/5a848831c5ba413cb8e03b9537e6b89d_1_mw.jpg
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/003cb58e31494b6bb1ea000307ddee9e_4_mw.png
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/9aed5586d0f042c9a4e3851ae6a86416_7_mw.png
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/f85aaf011e87487a99908e97006f431e_5_mw.png
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/535a357c224a4eb396774066a8132b8d_6_mw.png
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/97ce4fd1dd11402fafbb423d34b6a127_2_mw.jpg
listing-photo-e76eaee12eb848c58b98ec688f9ff576-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e76eaee12eb848c58b98ec688f9ff576/18d05fd8039043f3adfc09571e623273_3_mw.jpg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

101990


웨이퍼 사이즈:

6"/150mm


빈티지:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
KLA-Tencor Candela CS20 Optical Defect Inspection
환경 설정
Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å; deep. - Pits: 20 μm diameter, 50 Å; deep - Stains: 20 μm diameter, 10 Å; thick [ Application ] - Opaque substrates - EPI Layers - Transparent film coatings (SiC, GaN, Sapphire
OEM 모델 설명
The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
문서

문서 없음