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KLA PUMA 9150
    설명
    Darkfield Inspection
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Puma 9150 is a Laser Imaging Patterned Wafer Inspection System developed by KLA Corporation. It combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers. The Puma 9150 provides enhanced capture of low profile, large area defects, such as underpolish and slurry residues from copper CMP. It also improves darkfield defect capture in etch applications, such as microbridges and partially or fully blocked vias.
    문서

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    검증됨

    카테고리
    Defect Inspection

    마지막 검증일: 19일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    147692


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    KLA PUMA 9150

    KLA

    PUMA 9150

    Defect Inspection
    빈티지: 0조건: 중고
    마지막 검증일19일 전

    KLA

    PUMA 9150

    verified-listing-icon
    검증됨
    카테고리
    Defect Inspection
    마지막 검증일: 19일 전
    listing-photo-4563dea52e724235a2d187566c26eea1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    147692


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Darkfield Inspection
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Puma 9150 is a Laser Imaging Patterned Wafer Inspection System developed by KLA Corporation. It combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers. The Puma 9150 provides enhanced capture of low profile, large area defects, such as underpolish and slurry residues from copper CMP. It also improves darkfield defect capture in etch applications, such as microbridges and partially or fully blocked vias.
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA PUMA 9150

    KLA

    PUMA 9150

    Defect Inspection빈티지: 0조건: 중고마지막 검증일:19일 전