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KLA 2835
  • KLA 2835
  • KLA 2835
  • KLA 2835
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OEM 모델 설명
The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
문서

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PREFERRED
 
SELLER
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검증됨

카테고리
Defect Inspection

마지막 검증일: 5일 전

Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

125565


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

KLA

2835

verified-listing-icon
검증됨
카테고리
Defect Inspection
마지막 검증일: 5일 전
listing-photo-bb5c1ac21e6541c0a20a1b03e8195979-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

125565


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
문서

문서 없음