설명
설명 없음환경 설정
. Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)OEM 모델 설명
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.문서
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SEMILAB
FAAST 230
검증됨
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
102007
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
SEMILAB
FAAST 230
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
102007
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
. Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)OEM 모델 설명
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.문서
문서 없음