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APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT
  • APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT
  • APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT
  • APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT
설명
VIA W
환경 설정
VIA W
OEM 모델 설명
Employing a unique, “selective” suppression mechanism, the Centura® iSprint™ ALD/CVD SSW process delivers the industry’s first bottom-up CVD W gap fill, free of voids and seams. It optimizes the volume of W, creating more robust features and helping to improve yield.
문서

문서 없음

카테고리
Deposition

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

91266


웨이퍼 사이즈:

12"/300mm


빈티지:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

CENTURA AP ISPRINT

verified-listing-icon
검증됨
카테고리
Deposition
마지막 검증일: 60일 이상 전
listing-photo-b622ab0c913f4f649d385baf4cc0a21b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

91266


웨이퍼 사이즈:

12"/300mm


빈티지:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
VIA W
환경 설정
VIA W
OEM 모델 설명
Employing a unique, “selective” suppression mechanism, the Centura® iSprint™ ALD/CVD SSW process delivers the industry’s first bottom-up CVD W gap fill, free of voids and seams. It optimizes the volume of W, creating more robust features and helping to improve yield.
문서

문서 없음