설명
Complete system환경 설정
CVD System, 12” <45nm process 2 Chambers: CVD & ALD Process: NiOx, HfOx Trias cluster: 2 Loadports LM: Front end Main power distribution (MPD) Transfer module, TM EX reactor, PM2: Plasma capability: No Includes: Ozonizer & H20 Box 2 Touch screens ozonizer High-k CVD reactor PM4: Thermal based deposition Transformer box (Hi-K) option elec box: Manuals & Spareparts included Machine is in absolute as good as new condition ex R&D facility PM2: Hafnium Nickel Titaan Vanadium PM4: Hafnium Nickel Titaan Ruthenium StrontiumOEM 모델 설명
Trias High-k CVD system is a 300mm single-wafer cluster tool designed to produce thin-film materials required for the advanced gate stack, which will be incorporated in the most advanced semiconductor devices at the 45nm node and beyond.문서
TEL / TOKYO ELECTRON
TRIAS HIGH-k
검증됨
카테고리
Deposition
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
39978
웨이퍼 사이즈:
12"/300mm
빈티지:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIAS HIGH-k
카테고리
Deposition
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
39978
웨이퍼 사이즈:
12"/300mm
빈티지:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available