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TEL / TOKYO ELECTRON ALPHA(α)-303i
    설명
    설명 없음
    환경 설정
    Process: TEOS
    OEM 모델 설명
    The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.
    문서

    TEL / TOKYO ELECTRON

    ALPHA(α)-303i

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    검증됨

    카테고리

    Furnaces / Diffusion
    마지막 검증일: 60일 이상 전
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    70655


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2004

    Have Additional Questions?
    Logistics Support
    Available
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    Available
    Transaction Insured by Moov
    Available
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    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRONALPHA(α)-303iFurnaces / Diffusion
    빈티지: 0조건: 중고
    마지막 검증일7일 전

    TEL / TOKYO ELECTRON

    ALPHA(α)-303i

    verified-listing-icon

    검증됨

    카테고리

    Furnaces / Diffusion
    마지막 검증일: 60일 이상 전
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    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    70655


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2004


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Process: TEOS
    OEM 모델 설명
    The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.
    문서
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusion빈티지: 0조건: 중고마지막 검증일: 7일 전
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusion빈티지: 0조건: 중고마지막 검증일: 7일 전
    TEL / TOKYO ELECTRON ALPHA(α)-303i
    TEL / TOKYO ELECTRON
    ALPHA(α)-303i
    Furnaces / Diffusion빈티지: 2005조건: 중고마지막 검증일: 7일 전