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설명
Polysilicon Etch환경 설정
환경 설정 없음OEM 모델 설명
The Centura 5200 DPS R1 is a high-performance metal etch system introduced by Applied Materials1. It delivers high-productivity silicon, metal, and dielectric etch2. The system has two enhanced chambers: the DPS etch chamber and the ASP+ (advanced strip and passivation) module. The Centura 5200 DPS R1 system is designed for 150mm and 200mm or 8" wafer sizes.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
122925
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 DPS R1
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
122925
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Polysilicon Etch환경 설정
환경 설정 없음OEM 모델 설명
The Centura 5200 DPS R1 is a high-performance metal etch system introduced by Applied Materials1. It delivers high-productivity silicon, metal, and dielectric etch2. The system has two enhanced chambers: the DPS etch chamber and the ASP+ (advanced strip and passivation) module. The Centura 5200 DPS R1 system is designed for 150mm and 200mm or 8" wafer sizes.문서
문서 없음