설명
설명 없음환경 설정
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 모델 설명
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147163
웨이퍼 사이즈:
알 수 없음
빈티지:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA 5200
카테고리
Dry / Plasma Etch
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147163
웨이퍼 사이즈:
알 수 없음
빈티지:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 모델 설명
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.문서
문서 없음