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APPLIED MATERIALS (AMAT) CENTURA HART AP
    설명
    1/1/26
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    OEM 모델 설명
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
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    카테고리
    Dry / Plasma Etch

    마지막 검증일: 28일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    148128


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch
    빈티지: 0조건: 중고
    마지막 검증일28일 전

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 28일 전
    listing-photo-d115fed2ac5243fb9b715a9fac92b990-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    148128


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    1/1/26
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:28일 전
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:28일 전
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:28일 전