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설명
ETCH환경 설정
ETCHOEM 모델 설명
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
23723
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
23723
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ETCH환경 설정
ETCHOEM 모델 설명
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.문서
문서 없음