설명
Plasma환경 설정
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM 모델 설명
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
142376
웨이퍼 사이즈:
알 수 없음
빈티지:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
카테고리
Dry / Plasma Etch
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
142376
웨이퍼 사이즈:
알 수 없음
빈티지:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Plasma환경 설정
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM 모델 설명
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.문서
문서 없음