설명
설명 없음환경 설정
Metal Etcher (4 Chamber) 208V, 50/60 Hz, with Transfer Chamber Lift, HP Robot with Metal Blade, Endpoint with Four Monochromators, Smoke and Water Leak Detect, Independent Helium Cooling, Seriplex Gas Panel w/Top Feed Exhaust, Wafer Mapping, Wafer on Blade Sensors and Umbilicals. Chamber Breakdown Includes: [Chamber A: DPS R0 Poly, w/1110-01043 Source RF match AZX 90; Dual manometers with .1Torr and 10Torr Heads, Backside Helium Cooling; 200mm Cathode, & Osaka TG2003M Turbo] [Chamber B: Poly Etch: Mark II 3 Piece Chamber; Mark II Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber C: Poly Etch: Uni-Body Chamber; MxP Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber D: DPS R1 Metal/Deep Trench Etch: Source RF Match w/AZX-90 Upgrade, Dual Manometers with .1Torr and 10Torr Heads, VAT Throttling Gate Valve, Heated Pump Stack, 200mm Cathode SNNF ESC, & Alcatel ATH 1300M Turbo] [Chamber E: Wafer Orienter, 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] [Chamber F: Wafer Orienter , 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] Remote Equipment Includes: (1ea.) RF Rack with the Following Configured Generators: [(1ea.) Advanced Energy RFG/AZX Control; (2ea.) Advanced Energy RF-20RWC; (2ea.) ENI OEM 12B-02; (1ea.) ENI OEM 12B3 and (1ea.) Osaka TD2000 turbo controller]; (2ea.) Neslab HX150 with Heater Control; (1ea.) Neslab HX150 without Heater Control; (3ea.) Edwards IH80 Pumps; & (2ea.) Alcatel ADP81 Pumps.OEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.문서
문서 없음
APPLIED MATERIALS (AMAT)
CENTURA
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
57415
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
57415
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Metal Etcher (4 Chamber) 208V, 50/60 Hz, with Transfer Chamber Lift, HP Robot with Metal Blade, Endpoint with Four Monochromators, Smoke and Water Leak Detect, Independent Helium Cooling, Seriplex Gas Panel w/Top Feed Exhaust, Wafer Mapping, Wafer on Blade Sensors and Umbilicals. Chamber Breakdown Includes: [Chamber A: DPS R0 Poly, w/1110-01043 Source RF match AZX 90; Dual manometers with .1Torr and 10Torr Heads, Backside Helium Cooling; 200mm Cathode, & Osaka TG2003M Turbo] [Chamber B: Poly Etch: Mark II 3 Piece Chamber; Mark II Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber C: Poly Etch: Uni-Body Chamber; MxP Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber D: DPS R1 Metal/Deep Trench Etch: Source RF Match w/AZX-90 Upgrade, Dual Manometers with .1Torr and 10Torr Heads, VAT Throttling Gate Valve, Heated Pump Stack, 200mm Cathode SNNF ESC, & Alcatel ATH 1300M Turbo] [Chamber E: Wafer Orienter, 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] [Chamber F: Wafer Orienter , 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] Remote Equipment Includes: (1ea.) RF Rack with the Following Configured Generators: [(1ea.) Advanced Energy RFG/AZX Control; (2ea.) Advanced Energy RF-20RWC; (2ea.) ENI OEM 12B-02; (1ea.) ENI OEM 12B3 and (1ea.) Osaka TD2000 turbo controller]; (2ea.) Neslab HX150 with Heater Control; (1ea.) Neslab HX150 without Heater Control; (3ea.) Edwards IH80 Pumps; & (2ea.) Alcatel ADP81 Pumps.OEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.문서
문서 없음