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설명
eMax CT+ Dielectric etch chamber Turbo pump: Alcatel ATH 1600M Bias RF (13.5 MHz) LF Bias RF (2 MHz) : Daihen RMN-50N1 (amat p/n : 0190-15322) Source RF (60 MHz): Daihen AMN-30H (amat p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz ENI GHW-50A (amat p/n : 0190-15319) 2 MHz ENI B-5002 (amat p/n : 0190-15320) 60 HHz AE Ovation 2760 (amat p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: amat p/n : 0010-24353환경 설정
환경 설정 없음OEM 모델 설명
The eMax chamber operates in a new process regime that distinguishes it from other medium density plasma systems and enables the precise, high-throughput etching of very small, deep features. The system's unique, tunable, magnetic confinement technology and cost-effective approach to controlling temperature allow the eMax chamber to achieve low particle levels and extended MWBC (mean wafers between clean) intervals, resulting in a significant advantage in system cost-of-ownership.The eMax chambers are available on Applied Materials' enhanced Etch Centura II multi-chamber platform, which features a dual blade robotic handling system for increased throughput. The eMax Centura II can be configured with up to four process chambers, allowing a significant operational cost advantage over more limited capacity three-chamber systems. eMax chambers also can be added to existing Centura and Centura II platforms.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
109952
웨이퍼 사이즈:
12"/300mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
EMAX CT+
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
109952
웨이퍼 사이즈:
12"/300mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
eMax CT+ Dielectric etch chamber Turbo pump: Alcatel ATH 1600M Bias RF (13.5 MHz) LF Bias RF (2 MHz) : Daihen RMN-50N1 (amat p/n : 0190-15322) Source RF (60 MHz): Daihen AMN-30H (amat p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz ENI GHW-50A (amat p/n : 0190-15319) 2 MHz ENI B-5002 (amat p/n : 0190-15320) 60 HHz AE Ovation 2760 (amat p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: amat p/n : 0010-24353환경 설정
환경 설정 없음OEM 모델 설명
The eMax chamber operates in a new process regime that distinguishes it from other medium density plasma systems and enables the precise, high-throughput etching of very small, deep features. The system's unique, tunable, magnetic confinement technology and cost-effective approach to controlling temperature allow the eMax chamber to achieve low particle levels and extended MWBC (mean wafers between clean) intervals, resulting in a significant advantage in system cost-of-ownership.The eMax chambers are available on Applied Materials' enhanced Etch Centura II multi-chamber platform, which features a dual blade robotic handling system for increased throughput. The eMax Centura II can be configured with up to four process chambers, allowing a significant operational cost advantage over more limited capacity three-chamber systems. eMax chambers also can be added to existing Centura and Centura II platforms.문서
문서 없음