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NANO

카테고리
Dry / Plasma Etch
개요

NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.

활성 등재물

5

서비스

검사, 보험, 감정, 물류

상위 등재물

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