설명
Plasma Barrel Asher환경 설정
환경 설정 없음OEM 모델 설명
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.문서
문서 없음
DIENER ELECTRONIC
NANO
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
82046
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
DIENER ELECTRONIC
NANO
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
82046
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Plasma Barrel Asher환경 설정
환경 설정 없음OEM 모델 설명
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.문서
문서 없음