설명
Vacuum plasma processing system환경 설정
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEM 모델 설명
Low-pressure plasma treatment unit문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
154930
웨이퍼 사이즈:
알 수 없음
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
DIENER ELECTRONIC
Nano SL PCCE
카테고리
Dry / Plasma Etch
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
154930
웨이퍼 사이즈:
알 수 없음
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Vacuum plasma processing system환경 설정
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEM 모델 설명
Low-pressure plasma treatment unit문서
문서 없음